Cakuda iskar gas ta lantarki

Iskar gas ta musammanya bambanta da na gabaɗayaiskar gas ta masana'antua cikin cewa suna da amfani na musamman kuma ana amfani da su a wasu fannoni. Suna da takamaiman buƙatu don tsarki, abubuwan da ke cikin ƙazanta, abun da ke ciki, da halayen zahiri da na sinadarai. Idan aka kwatanta da iskar gas ta masana'antu, iskar gas ta musamman sun fi bambanta a cikin nau'ikan amma suna da ƙananan adadin samarwa da tallace-tallace.

Thegaurayen iskar gaskumadaidaitaccen iskar gasMukan yi amfani da su a matsayin muhimman sassan iskar gas na musamman. Galibi ana raba iskar gas mai gauraya zuwa iskar gas mai gauraya da iskar gas mai gauraya ta lantarki.

Gas ɗin da aka haɗa gabaɗaya sun haɗa da:gaurayen iskar gas ta laser, gano kayan aiki gaurayen iskar gas, walda gaurayen iskar gas, kiyaye gaurayen iskar gas, hasken wutar lantarki gaurayen iskar gas, binciken likitanci da na halittu, kashe kwayoyin cuta da kuma tsaftace gaurayen iskar gas, ƙararrawa gaurayen iskar gas, gaurayen iskar gas mai matsin lamba, da iska mai sifili.

Iskar Laser

Haɗaɗɗen iskar gas na lantarki sun haɗa da gaurayen iskar gas na epitaxial, gaurayen iskar gas na tururi, gaurayen iskar gas na doping, gaurayen iskar gas na etching, da sauran gaurayen iskar lantarki. Waɗannan gaurayen iskar gas suna taka muhimmiyar rawa a masana'antar semiconductor da microelectronics kuma ana amfani da su sosai a cikin manyan da'irori masu haɗawa (LSI) da kuma manyan da'irori masu haɗawa (VLSI), da kuma a cikin samar da na'urorin semiconductor.

Nau'ikan iskar gas guda 5 da aka fi amfani da su

Gaurayen iskar gas mai narkewa

A cikin ƙera na'urorin semiconductor da da'irori masu haɗawa, ana shigar da wasu ƙazanta a cikin kayan semiconductor don samar da wutar lantarki da juriya da ake so, wanda ke ba da damar ƙera resistors, mahadar PN, yadudduka da aka binne, da sauran kayan. Iskar gas da ake amfani da su a cikin tsarin doping ana kiransu iskar gas ta dopant. Waɗannan iskar gas galibi sun haɗa da arsine, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, da kuma diborane. Tushen dopant yawanci ana haɗa shi da iskar gas mai ɗaukar kaya (kamar argon da nitrogen) a cikin kabad na tushe. Sannan ana ci gaba da zuba iskar gas ɗin da aka haɗa a cikin tanderu mai yaɗuwa kuma yana zagayawa a kusa da wafer ɗin, yana ajiye dopant ɗin a saman wafer ɗin. Sai dopant ɗin ya yi aiki da silicon don samar da ƙarfe mai dopant wanda ke ƙaura zuwa cikin silicon.

Cakuda iskar Diborane

Cakuda iskar gas mai girma na Epitaxial

Girman Epitaxial shine tsarin ajiya da haɓaka abu ɗaya na lu'ulu'u a saman substrate. A cikin masana'antar semiconductor, iskar gas da ake amfani da su don shuka ɗaya ko fiye da yadudduka na abu ta amfani da sinadarin tururi (CVD) akan wani abu da aka zaɓa da kyau ana kiransa da iskar epitaxial. Iskar gas ɗin epitaxial na silicon da aka saba amfani da su sun haɗa da dihydrogen dichlorosilane, silicon tetrachloride, da silane. Ana amfani da su musamman don adana silicon na epitaxial, adana silicon na polycrystalline, adana fim ɗin silicon oxide, adana fim ɗin silicon nitride, da adana fim ɗin silicon amorphous don ƙwayoyin hasken rana da sauran na'urori masu saurin daukar hoto.

Iskar dasa ion

A cikin na'urar semiconductor da kera da'irori masu haɗawa, iskar gas da ake amfani da su a cikin tsarin dasa ion ana kiransu da iskar gas ɗin dasa ion. Ana hanzarta ƙazanta na ion (kamar boron, phosphorus, da arsenic ions) zuwa matakin makamashi mai yawa kafin a dasa su cikin substrate. Fasahar dasa ion ana amfani da ita sosai don sarrafa ƙarfin wutar lantarki. Ana iya tantance adadin ƙazanta da aka dasa ta hanyar auna wutar lantarki ta ion beam. Iskar gas ɗin dasa ion yawanci sun haɗa da iskar phosphorus, arsenic, da boron.

Haɗakar iskar gas

Etching tsari ne na goge saman da aka sarrafa (kamar fim ɗin ƙarfe, fim ɗin silicon oxide, da sauransu) akan substrate ɗin da photoresist bai rufe ba, yayin da yake kiyaye yankin da photoresist ya rufe, don samun tsarin hoton da ake buƙata akan saman substrate.

Hadin Iskar Gas na Tsabtace Tururin Sinadarin

Tacewar tururin sinadarai (CVD) tana amfani da mahaɗan da ke canzawa don saka wani abu ko mahaɗi guda ɗaya ta hanyar amsawar sinadarai ta hanyar tururin. Wannan hanya ce ta samar da fim wanda ke amfani da halayen sinadarai na lokacin tururin. Iskar CVD da ake amfani da ita ta bambanta dangane da nau'in fim ɗin da ake samarwa.


Lokacin Saƙo: Agusta-14-2025