Carbon Tetrafluoride (CF4)

Takaitaccen Bayani:

Carbon tetrafluoride, kuma aka sani da tetrafluoromethane, iskar gas mara launi a yanayin zafi da matsa lamba, mara narkewa a cikin ruwa.Gas na CF4 a halin yanzu shine mafi yawan iskar gas ɗin plasma da ake amfani da shi a cikin masana'antar microelectronics.Hakanan ana amfani dashi azaman iskar gas, cryogenic refrigerant, sauran ƙarfi, mai mai, insulating abu, da sanyaya don bututun gano infrared.


Cikakken Bayani

Tags samfurin

Ma'aunin Fasaha

Ƙayyadaddun bayanai 99.999%
Oxygen+Argon ≤1pm
Nitrogen ≤4 ppm
Danshi (H2O) ≤3 ppm
HF ≤0.1 ppm
CO ≤0.1 ppm
CO2 ≤1 ppm
Farashin SF6 ≤1 ppm
Halocarbynes ≤1 ppm
Jimlar ƙazanta ≤10 ppm

Carbon tetrafluoride shine halogenated hydrocarbon tare da tsarin sinadarai CF4.Ana iya ɗaukarsa azaman halogenated hydrocarbon, halogenated methane, perfluorocarbon, ko azaman mahaɗar inorganic.Carbon tetrafluoride iskar gas mara launi da wari, maras narkewa a cikin ruwa, mai narkewa a cikin benzene da chloroform.Barga a ƙarƙashin zafin jiki na al'ada da matsa lamba, kauce wa ƙarfi mai ƙarfi, kayan wuta ko masu ƙonewa.Gas ba mai ƙonewa ba, matsa lamba na cikin akwati zai karu lokacin da zafi mai zafi ya bayyana, kuma akwai haɗarin fashewa da fashewa.Yana da tsayayye a sinadarai kuma ba mai ƙonewa.Ruwan ammonia-sodium karfe reagent ne kawai zai iya aiki a cikin zafin jiki.Carbon tetrafluoride shine iskar gas wanda ke haifar da tasirin greenhouse.Yana da kwanciyar hankali, yana iya zama a cikin yanayi na dogon lokaci, kuma iskar gas ce mai ƙarfi sosai.Ana amfani da tetrafluoride na carbon a cikin tsarin etching na jini na nau'ikan da'irori daban-daban.Hakanan ana amfani da ita azaman iskar Laser, kuma ana amfani dashi a cikin firigeren sanyi mai ƙarancin zafi, kaushi, mai mai, kayan hana ruwa, da masu sanyaya don gano infrared.Shi ne mafi amfani da plasma etching gas a cikin microelectronics masana'antu.Cakuda ne na tetrafluoromethane iskar gas mai tsafta da tetrafluoromethane mai tsafta da iskar oxygen mai tsafta.Ana iya amfani da shi sosai a cikin silicon, silicon dioxide, silicon nitride, da gilashin phosphosilicate.The etching na bakin ciki kayan fim kamar tungsten da tungsten kuma ana amfani da ko'ina a cikin surface tsaftacewa na lantarki na'urorin, hasken rana samar cell, Laser fasahar, low-zazzabi refrigeration, leak dubawa, da kuma wanka a buga kewaye samar.An yi amfani da shi azaman firiji mai ƙarancin zafin jiki da fasahar busasshen etching na plasma don haɗaɗɗun da'irori.Tsare-tsare don ajiya: Ajiye a cikin ɗakin ajiya mai sanyi, mai iska mara ƙonewa.Ka nisantar da wuta da tushen zafi.Yanayin ajiya bai kamata ya wuce 30 ° C ba.Ya kamata a adana shi daban daga sauƙi (mai iya ƙonewa) masu ƙonewa da kuma oxidants, kuma a guje wa ajiya mai gauraya.Wurin ajiya ya kamata a sanye shi da kayan aikin jinya na gaggawa.

Aikace-aikace:

① Firji:

Tetrafluoromethane wani lokaci ana amfani dashi azaman sanyi mai ƙarancin zafin jiki.

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② Ciwon kai:

Ana amfani dashi a cikin microfabrication na lantarki kadai ko a hade tare da oxygen a matsayin wani abu na plasma don silicon, silicon dioxide, da silicon nitride.

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Kunshin al'ada:

Samfura Carbon TetrafluorideCF4
Girman Kunshin 40Ltr Silinda 50Ltr Silinda  
Cika Net Weight/Cyl 30kg 38kg  
An lodin QTY a cikin Kwantena 20' 250 Cyl 250 Cyl
Jimlar Nauyin Net 7.5 ton Ton 9.5
Silinda Tare Weight 50kg 55kg
Valve Farashin CGA580

Amfani:

①Tsarin tsafta, sabon kayan aiki;

② ISO takardar shaidar manufacturer;

③Saurin bayarwa;

④ Tsarin bincike na kan layi don kula da inganci a kowane mataki;

⑤ Babban buƙatu da ingantaccen tsari don sarrafa silinda kafin cikawa;


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