Epitaxial (girma)Mixed Gas

A cikin masana'antar semiconductor, iskar gas ɗin da ake amfani da shi don girma ɗaya ko fiye yadudduka na abu ta hanyar sanya tururin sinadarai a kan wani zaɓin da aka zaɓa a hankali ana kiransa iskar epitaxial.

Gases na epitaxial silicon da aka fi amfani da su sun haɗa da dichlorosilane, silicon tetrachloride dasilane. Yafi amfani da epitaxial silicon jijiya, silicon oxide film adibas, silicon nitride film adibas, amorphous silicon film shaida ga hasken rana Kwayoyin da sauran photoreceptors, da dai sauransu Epitoxy ne wani tsari a cikin abin da guda crystal abu ne ajiya da kuma girma a saman wani substrate.

Haɗin Gas ɗin Haɗaɗɗen Chemical (CVD).

CVD wata hanya ce ta adana wasu abubuwa da mahadi ta hanyar halayen sinadarai na zamani ta hanyar amfani da mahalli masu canzawa, watau, hanyar samar da fim ta amfani da halayen sinadaran lokaci na iskar gas. Dangane da nau'in fim ɗin da aka samar, iskar gas ɗin tururin sinadari (CVD) da ake amfani da shi shima ya bambanta.

DopingGas mai gauraya

A cikin kera na'urorin semiconductor da haɗaɗɗun da'irori, wasu ƙazanta suna doped cikin kayan semiconductor don ba kayan nau'in halayen da ake buƙata da kuma wani takamaiman tsayayya don kera resistors, PN junctions, binne yadudduka, da sauransu. Gas da ake amfani da shi a cikin tsarin doping ana kiransa iskar doping.

Yafi ya hada da arsine, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, diborane, da dai sauransu.

Yawancin lokaci, tushen doping yana haɗe da iskar gas (kamar argon da nitrogen) a cikin majalisar tushe. Bayan hadawa, ana ci gaba da shigar da kwararar iskar gas a cikin tanderun da ake watsawa kuma a kewaye wafer, a ajiye dopants a saman wafer, sannan a mayar da martani da siliki don samar da karafa da ke yin ƙaura zuwa silicon.

EtchingCakudar Gas

Etching shine a cire saman aiki (kamar fim ɗin ƙarfe, fim ɗin silicon oxide, da sauransu) akan mashin ɗin ba tare da masking na hoto ba, yayin da ake adana wurin tare da masking na hoto, don samun ƙirar hoto da ake buƙata akan saman ƙasa.

Hanyoyin ƙazanta sun haɗa da rigar etching sinadarai da bushewar sinadari. Gas da ake amfani da shi a bushewar sinadarai ana kiransa etching gas.

Etching gas yawanci iskar fluoride ne (halide), kamarcarbon tetrafluoride, nitrogen trifluoride, trifluoromethane, hexafluoroethane, perfluoropropane, da dai sauransu.