Epitaxial (girma)Gauraye gas

A cikin masana'antar semictionectory, gas da ake amfani da yadudduka ɗaya ko fiye da kayan turɓaya a hankali ana kiranta gas mai kyau.

Manyan gas na Silicon sun haɗa da Dichlorosilane, Silicon Tetrachloride dasilane. Game da amfani da silicon ajiye silicon, silicon oitride fim ajiye, da sauran su, da sauransu, kayan proTocon tsari ne wanda aka ajiye kuma girma a farfajiya na substrate.

Kayan aikin tururuwa (CVD) mai gauraye gas

CVD hanya ce ta ajiye wasu abubuwan da gas na gas ta amfani da kayan masarufi, watau hanya samar da hanyar fim ta amfani da halayen sinadarin gas. Ya danganta da nau'in fim ɗin, da gas mai guba (CVD) mai amfani dashi ma ya bambanta.

SaɓeGas

A cikin kera na'urorin semiconduttor da ke hade da su, wasu impurities suna cikin kayan da ake buƙata na kayan da ake buƙata ana kiran gas da gas.

Akasarinsu ya haɗa da fataucin fata, phosphine, phosphrorus pentafloritide, Arsenic Triflulade, Artenic Pentaflumide,Boron Triflulaure, Dibora, da sauransu.

Yawancin lokaci, tushen doping an haɗe shi da mai ɗaukar kaya (kamar Argon da nitrogen) a cikin majalisar manajan. Bayan hadawa, ana ci gaba da kwararar gas a cikin tsinkayen tarkon kuma yana kewaye da silicon don samar da silatal din da ke haifar da silicon.

UntucniCakuda gas

Etching shine etch wofowarfin aiki (kamar fim ɗin ƙarfe, silicon oxide fim, da sauransu) a kan subchate ba tare da photeresist da aka buƙaci a kan substrate tsari.

Hanyoyin etching sun haɗa da rigar sinadarai da bushe bushe. An yi amfani da gas a cikin busassun ƙwayoyin cuta masu guba ana kiran shi iskar gas.

Iskar gas yawanci ana amfani da gas (halide), kamarCarbon Tetrafluhlide, titrogen barloride, trifluoromethane, hexluorooroethane, perluoropropane, da sauransu.