A cikin tsarin kera masana'antun wafer na semiconductor waɗanda ke da tsarin samarwa na zamani, ana buƙatar kusan nau'ikan iskar gas 50 daban-daban. Galibi ana raba iskar gas zuwa manyan iskar gas da kuma iskar gas mai yawa.iskar gas ta musamman.

Amfani da iskar gas a masana'antun microelectronics da semiconductor Amfani da iskar gas koyaushe yana taka muhimmiyar rawa a cikin hanyoyin semiconductor, musamman hanyoyin semiconductor ana amfani da su sosai a masana'antu daban-daban. Daga ULSI, TFT-LCD zuwa masana'antar micro-electromechanical (MEMS) na yanzu, ana amfani da hanyoyin semiconductor a matsayin hanyoyin kera samfura, gami da etching bushe, oxidation, dasa ion, adana fim mai sirara, da sauransu.

Misali, mutane da yawa sun san cewa an yi guntu da yashi, amma idan aka duba dukkan tsarin ƙera guntu, ana buƙatar ƙarin kayan aiki, kamar su masu hana haske, ruwan gogewa, kayan da aka yi niyya, iskar gas ta musamman, da sauransu ba makawa ne. Marufi na baya kuma yana buƙatar substrates, masu shiga tsakani, firam ɗin gubar, kayan haɗin kai, da sauransu na kayan aiki daban-daban. Iskar gas ta lantarki ita ce ta biyu mafi girma a cikin farashin ƙera semiconductor bayan wafers na silicon, sai kuma abin rufe fuska da masu hana haske.

Tsabtar iskar gas tana da tasiri mai mahimmanci akan aikin sassan da yawan samfura, kuma amincin samar da iskar gas yana da alaƙa da lafiyar ma'aikata da amincin aikin masana'anta. Me yasa tsaftar iskar gas ke da babban tasiri ga layin aiki da ma'aikata? Wannan ba ƙari ba ne, amma ana ƙaddara shi ta hanyar halayen haɗari na iskar gas ɗin da kansa.

Rarraba iskar gas ta gama gari a cikin masana'antar semiconductor

Iskar Gas ta Yau da Kullum

Ana kuma kiran iskar gas ta yau da kullun da iskar gas mai yawa: tana nufin iskar gas ta masana'antu wadda take da buƙatar tsarki ƙasa da 5N da kuma yawan samarwa da tallace-tallace mai yawa. Ana iya raba ta zuwa iskar gas ta raba iska da iskar gas ta roba bisa ga hanyoyin shiri daban-daban. Hydrogen (H2), nitrogen (N2), oxygen (O2), argon (A2), da sauransu;

Iskar Gas ta Musamman

Iskar gas ta musamman tana nufin iskar gas ta masana'antu da ake amfani da ita a wasu fannoni kuma tana da buƙatu na musamman don tsarki, iri-iri, da kuma kaddarorinta.SiH4, PH3, B2H6, A8H3,HCL, CF4,NH3, POCL3, SIH2CL2, SIHCL3,NH3, BCL3, SIF4, CLF3, CO, C2F6, N2O, F2, HF, HBR,SF6... da sauransu.

Nau'ikan iskar gas na musamman

Nau'ikan iskar gas na musamman: mai lalata, mai guba, mai ƙonewa, mai tallafawa ƙonewa, mara aiki, da sauransu.
Ana rarraba iskar gas ta semiconductor da aka fi amfani da ita kamar haka:
(i) Mai lalata/guba:HCl、BF3、 WF6、 HBr、SiH2Cl2、NH3、 PH3、Cl2、BCl3…
(ii) Mai iya ƙonewa: H2,CH4、SiH4PH3,AsH3,SiH2Cl2,B2H6,CH2F2,CH3F,CO…
(iii) Mai ƙonewa: O2、Cl2、N2O、NF3…
(iv) Marasa aiki: N2,CF4、C2F6、C4F8、SF6、CO2、Ne、Kr、Ya…

A tsarin kera guntu na semiconductor, ana amfani da nau'ikan iskar gas na musamman guda 50 (wanda ake kira iskar gas ta musamman) a cikin iskar shaka, yaɗuwa, adanawa, ƙawatawa, allura, photolithography da sauran hanyoyin aiki, kuma jimillar matakan aikin sun wuce ɗaruruwa. Misali, ana amfani da PH3 da AsH3 a matsayin tushen phosphorus da arsenic a cikin tsarin dasa ion, iskar gas mai tushen F CF4, CHF3, SF6 da iskar halogen CI2, BCI3, HBr galibi ana amfani da su a cikin tsarin etching, SiH4, NH3, N2O a cikin tsarin adanawa, F2/Kr/Ne, Kr/Ne a cikin tsarin photolithography.

Daga abubuwan da ke sama, za mu iya fahimtar cewa iskar gas mai yawan semiconductor tana da illa ga jikin ɗan adam. Musamman ma, wasu daga cikin iskar gas, kamar SiH4, suna kunna wutar da kansu. Muddin sun zube, za su yi martani mai ƙarfi da iskar oxygen a cikin iska kuma su fara ƙonewa; kuma AsH3 yana da guba sosai. Duk wani ƙaramin ɓugewa na iya haifar da lahani ga rayuwar mutane, don haka buƙatun amincin ƙirar tsarin sarrafawa don amfani da iskar gas na musamman suna da yawa musamman.

Masu amfani da semiconductor suna buƙatar iskar gas mai tsafta don samun "digiri uku"

Tsarkakakkiyar iskar gas

Yawan gurɓataccen iskar gas a cikin iskar gas yawanci ana bayyana shi a matsayin kashi na tsarkin iskar gas, kamar kashi 99.9999%. Gabaɗaya, buƙatar tsarkin iskar gas ta musamman ta lantarki ta kai 5N-6N, kuma ana bayyana shi ta hanyar rabon yawan gurɓataccen iskar ppm (sashi a kowace miliyan), ppb (sashi a kowace biliyan), da ppt (sashi a kowace tiriliyan). Filin semiconductor na lantarki yana da mafi girman buƙatun don tsarki da kwanciyar hankali na iskar gas ta musamman, kuma tsarkin iskar gas ta musamman ta lantarki gabaɗaya ya fi 6N girma.

Busasshiyar ƙasa

Yawan ruwan da ke cikin iskar gas, ko danshi, yawanci ana bayyana shi a cikin yanayin raɓa, kamar yanayin raɓa -70℃.

Tsafta

Adadin ƙwayoyin da ke gurɓata iskar gas, ƙwayoyin da girmansu ya kai µm, ana bayyana su a cikin adadin ƙwayoyin/M3. Ga iskar da aka matse, yawanci ana bayyana ta a cikin mg/m3 na ragowar daskararru da ba za a iya mantawa da su ba, wanda ya haɗa da yawan mai.