Iskar Gas ta Musamman
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Tetrafluoride na Sulfur (SF4)
Lambar EINECS: 232-013-4
Lambar CAS: 7783-60-0 -
Nitrous Oxide (N2O)
Nitrous oxide, wanda aka fi sani da iskar shaƙa, sinadari ne mai haɗari tare da dabarar sinadarai ta N2O. Iska ce mara launi, mai ƙamshi mai daɗi. N2O wani sinadari ne mai hana ƙonewa wanda zai iya taimakawa ƙonewa a wasu yanayi, amma yana da karko a zafin ɗaki kuma yana da ɗan tasirin maganin sa barci, kuma yana iya sa mutane dariya. -
Carbon Tetrafluoride (CF4)
Carbon tetrafluoride, wanda aka fi sani da tetrafluoromethane, iskar gas ce mara launi a yanayin zafi da matsin lamba na yau da kullun, wacce ba ta narkewa a cikin ruwa. Iskar CF4 a halin yanzu ita ce iskar da aka fi amfani da ita a masana'antar microelectronics. Haka kuma ana amfani da ita azaman iskar laser, firiji mai sanyi, mai narkewa, mai, kayan rufewa, da kuma sanyaya don bututun gano infrared. -
Sulfuryl Fluoride (F2O2S)
Ana amfani da sinadarin Sulfuryl fluoride SO2F2, iskar gas mai guba, galibi a matsayin maganin kwari. Saboda sinadarin sulfuryl fluoride yana da halaye na yaɗuwa mai ƙarfi da kuma ikon shiga, maganin kwari mai faɗi, ƙarancin allurai, ƙarancin ragowar da ya rage, saurin kashe kwari cikin sauri, gajeren lokacin watsa iskar gas, sauƙin amfani a ƙananan zafin jiki, babu wani tasiri ga ƙimar tsiro da ƙarancin guba, da yawa ana amfani da shi sosai a cikin rumbunan ajiya, jiragen ruwa na kaya, gine-gine, madatsun ruwa, rigakafin tururuwa, da sauransu. -
Silane (SiH4)
Silane SiH4 iskar gas ce mara launi, mai guba kuma mai aiki sosai a yanayin zafi da matsin lamba na yau da kullun. Ana amfani da Silane sosai a cikin haɓakar epitaxial na silicon, kayan aiki na polysilicon, silicon oxide, silicon nitride, da sauransu, ƙwayoyin hasken rana, zare na gani, kera gilashi mai launi, da kuma adana tururin sinadarai. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, tsarkin iskar gas: 99.999%, galibi ana amfani da shi azaman mai samar da iskar gas mai narkewa da kuma matsakaicin iskar gas. Sau da yawa ana amfani da shi a cikin tsarin PECVD (Plasma Enhance. Chemical Vapor deposition), ana amfani da C4F8 azaman madadin CF4 ko C2F6, ana amfani da shi azaman iskar gas mai tsaftacewa da iskar gas mai narkewa. -
Nitric Oxide (NO)
Iskar Nitric oxide wani mahaɗi ne na nitrogen tare da dabarar sinadarai ta NO. Iska ce mara launi, mara ƙamshi, mai guba wadda ba ta narkewa a cikin ruwa. Nitric oxide yana da tasiri sosai a fannin sinadarai kuma yana amsawa da iskar oxygen don samar da iskar nitrogen dioxide mai lalata (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gas iskar gas ce mara launi mai ƙamshi mai kamshi. Maganin ruwansa ana kiransa hydrochloric acid, wanda aka fi sani da hydrochloric acid. Ana amfani da hydrogen chloride galibi wajen yin rini, kayan ƙanshi, magunguna, chlorides daban-daban da kuma hana tsatsa. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, tsarin sinadarai: C3F6, iskar gas ce mara launi a yanayin zafi da matsin lamba na yau da kullun. Ana amfani da ita galibi don shirya samfuran sinadarai masu kyau waɗanda ke ɗauke da fluorine, tsaka-tsakin magunguna, abubuwan kashe gobara, da sauransu, kuma ana iya amfani da ita don shirya kayan polymer masu ɗauke da fluorine. -
Ammoniya (NH3)
Ruwan ammonia/ammonia mai ruwa-ruwa muhimmin abu ne na sinadarai wanda ke da amfani iri-iri. Ana iya amfani da ruwan ammonia a matsayin abin sanyaya iska. Ana amfani da shi galibi wajen samar da sinadarin nitric acid, urea da sauran takin zamani na sinadarai, kuma ana iya amfani da shi azaman kayan aiki na magani da magungunan kashe kwari. A masana'antar tsaro, ana amfani da shi wajen yin abubuwan da za su iya samar da rokoki da makamai masu linzami.
