Gas na Musamman
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Sulfur Tetrafluoride (SF4)
EINECS NO: 232-013-4
Saukewa: 7783-60-0 -
Nitrous Oxide (N2O)
Nitrous oxide, kuma aka sani da iskar gas, sinadari ne mai haɗari tare da dabarar sinadarai N2O. Gas ne mara launi, mai kamshi. N2O wani oxidant ne wanda zai iya tallafawa konewa a ƙarƙashin wasu yanayi, amma yana da kwanciyar hankali a cikin zafin jiki kuma yana da ɗan tasirin sa barci. , kuma yana iya sa mutane dariya. -
Carbon Tetrafluoride (CF4)
Carbon tetrafluoride, kuma aka sani da tetrafluoromethane, iskar gas mara launi a yanayin zafi da matsa lamba, mara narkewa a cikin ruwa. Gas na CF4 a halin yanzu shine mafi yawan iskar gas ɗin plasma da ake amfani da shi a cikin masana'antar microelectronics. Hakanan ana amfani dashi azaman iskar gas, cryogenic refrigerant, sauran ƙarfi, mai mai, insulating abu, da sanyaya don bututun gano infrared. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, iskar gas mai guba, galibi ana amfani dashi azaman maganin kwari. Saboda sulfuryl fluoride yana da halaye na yaduwa mai ƙarfi da haɓakawa, ƙwayar kwari mai faɗi, ƙarancin ƙima, ƙarancin saura, saurin kwari, ɗan gajeren lokacin watsawar gas, amfani mai dacewa a ƙananan zafin jiki, babu tasiri akan ƙimar germination da ƙarancin guba, ƙari. Ana ƙara yin amfani da shi a cikin ɗakunan ajiya, jiragen ruwa, gine-gine, madatsun ruwa, rigakafin kutuwa, da dai sauransu. -
Silane (SiH4)
Silane SiH4 mara launi ne, mai guba kuma iskar gas mai aiki sosai a zafin jiki na al'ada da matsa lamba. Ana amfani da Silane ko'ina a cikin ci gaban epitaxial na silicon, albarkatun ƙasa don polysilicon, silicon oxide, silicon nitride, da dai sauransu, ƙwayoyin hasken rana, fiber na gani, masana'antar gilashin launi, da jigilar sinadarai. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, gas tsarki: 99.999%, sau da yawa amfani da abinci aerosol propellant da matsakaici gas. Ana amfani da shi sau da yawa a cikin semiconductor PECVD (Plasma Enhance. Chemical Vapor Deposition) tsari, C4F8 ana amfani dashi azaman madadin CF4 ko C2F6, ana amfani dashi azaman tsaftacewa gas da semiconductor aiwatar etching gas. -
Nitric Oxide (NO)
Nitric oxide gas wani fili ne na nitrogen tare da dabarar sinadarai NO. Gas ne mara launi, mara wari, mai guba wanda ba ya narkewa a cikin ruwa. Nitric oxide yana da ƙarfi sosai kuma yana amsawa tare da iskar oxygen don samar da iskar iskar iskar iskar oxygen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gas iskar gas mara launi tare da ƙamshi mai ƙamshi. Maganin ruwansa ana kiransa hydrochloric acid, wanda kuma aka sani da hydrochloric acid. Ana amfani da sinadarin hydrogen chloride don yin rini, kayan yaji, magunguna, chlorides iri-iri da masu hana lalata. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, dabarar sinadarai: C3F6, iskar gas mara launi a yanayin zafi na al'ada da matsa lamba. Ana amfani da shi musamman don shirya samfuran sinadarai masu kyau masu ɗauke da fluorine daban-daban, masu tsaka-tsaki na magunguna, abubuwan kashe wuta, da sauransu, kuma ana iya amfani da su don shirya kayan polymer mai ɗauke da fluorine. -
Ammoniya (NH3)
Liquid ammonia / anhydrous ammonia wani muhimmin sinadari ne mai albarkatun ƙasa tare da aikace-aikace da yawa. Za a iya amfani da ammonia mai ruwa a matsayin mai sanyaya. Ana amfani da shi musamman don samar da nitric acid, urea da sauran takin mai magani, kuma ana iya amfani dashi azaman ɗanyen magani da magungunan kashe qwari. A cikin masana'antar tsaro, ana amfani da ita don kera makaman roka da makamai masu linzami.
